About Optical Simulation

In order to meet the various requirements of our customers, we possess several in-house optical simulation technologies.
In addition, we are constantly developing simulation technologies to realize state-of-the-art optical elements.
Here is an example.

Optical Multilayer Simulation

Simulation results of transmittance and reflectance of optical multilayers.
They are the key to the accuracy of our photonic crystal products.
(Matrix Calculation)

 

Wave Simulation

Simulates the behavior of light, which is a wave.
It is essential for the design of photonic crystals.
(Beam propagation method, FDTD method)

Polarization Simulation

Simulates the state of polarization.
This technique is indispensable for calibration of birefringence measurement systems and ellipsometers, and analysis of measurement results.
(Stokes vector, Jones vector)

related product

WPA-200Series

WPA series that expands the measurement range of phase difference from 0 to 3,500 nm by measuring the distribution of birefringence/phase difference over three waves.
Suitable for measurement of films and transparent resin products.

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PA-300Series

PA series measures birefringence and phase difference with high resolution of 5 million pixels at high speed, for low phase difference with a measurement range of 0 to 130 nm.
Suitable for measurement of glassware and other low phase difference targets.

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SE-101

This compact point measurement system provides high-accuracy and high-repeatability thin film measurements.
Its detachable head can be used as a separate module to integrate into your manufacturing infrastructure.

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KAMAKIRI X-Stage

KAMAKIRI X-stage is a compact desktop inspection system that is a line scan type. Since the basic algorithm is unified with the inline system, it can be used as an introductory machine before introducing the inline system.

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Related solutions

Full-length, full-width film quality control

With the industry's first full-surface measurement technology for birefringence distribution in optical films, we contribute to the improvement of film quality that leads to the assurance of image quality across the entire display screen.

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Ultra-precision micro laser processing

Microfabrication technology is becoming increasingly important for next-generation EVs and semiconductor devices. We support the development of this field with our unique beam shaping, polarization control, and high speed temperature imaging technologies.

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Birefringence & Stress Strain Measurement

We have improved conventional birefringence measurement from point measurement to 2-D surface measurement. High-speed, high-precision birefringence measurement contributes to quality evaluation and functional improvement of optical materials.

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Next-generation Optical Communications

Polarization control is becoming increasingly important in next-generation optical communications. In addition to application examples of our proprietary photonic crystals, we also introduce upcoming functions in the future.

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