PRODUCT DETAILS

Thin film thickness / refractive index ellipsometric measurement SE Series

SE-101

A compact ellipsometer that achieves high measurement accuracy and high speed in point measurement.
The head unit is separable and can be incorporated into production lines and laboratory equipment.

Specifications
  • measurement
Repeatability
  • Thickness: 0.1nm
    Refractive index: 0.001 ※Standard deviation of the 100 repeatedly measurement of SiO2 (about 100 nm thickness) on Si
Speed
  • Smallest sampling interval
    0.05 sec.
Light source
  • Semiconductor Laser (wavelength: 636nm)
Spot size
  • Approx. 1mm □
Incident angle
  • 70°
Dimensions
(W x D x H)
  • 270 × 337 × Max 631mm
  • Hardware
Sample stage size
  • Max. 4 inch
    (manual XY stage in option stroke: ±20mm)
Dimensions
(W x D x H)
  • 250 × 175 × 218.3mm
Weight
  • Approx. 5kg
Interface
  • GigE (camera signal)
  • Miscellaneous
Interface
  • GigE（camera signal）
Power supply
  • AC100～240V
Software
  • SE-View
Accessories
  • Notebook PC, User manual, Standard sample
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Thin film thickness / refractive index ellipsometric measurement ME/SE Series

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Category

  • #Ellipsometric measurement

related product

ME-210/ME-210-T

This mapping ellipsometer can measure the entire surface of up to φ8" wafers (up to ⌀300mm with option), enabling high-speed, high-resolution surface measurement of film thickness changes of 1nm or less.

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SE-101

This compact point measurement system provides high-accuracy and high-repeatability thin film measurements.
Its detachable head can be used as a separate module to integrate into your manufacturing infrastructure.

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