High-Speed Ellipsometer 2D Film Thickness Measurement System
ME-210 / ME-310
ME-210/ME-310 2D scan allows to measure the film thickness changes of less than 1 nm
at high speed and high density. Support size up to φ12 inches (300 mm) wafer.
Various functions / options to support film thickness measurement.
・compatible with transparent substrates
・zoom & high resolution measurement
Case Studies
Resist thickness coated by spin-courting process
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| Repeatability |
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| Speed |
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| Light source |
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| Spot size |
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| Incident angle |
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| Dimensions (W x D x H) |
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| Transparent substrate measurement |
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| Sample stage size |
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| Dimensions (W x D x H) |
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| Weight |
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| Interface |
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| Power supply |
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| Software |
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| Accessories |
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