Features

ME/SE Series features

High-speed

High-speed evaluation of full area wafers (up to 12 inch).
Using an unprecedented amount of data, you can provide feedback to your troubleshooting process and bring your quality control to a new level.

・Thickness measurement upgraded from “point” to full-fledged “surface” evaluation
・Whole surface evaluation provides great insights for process evaluation

High-speed
High-speed

ME/SE Series features

High-resolution
ME-210(-T)

In addition to its large surface measurement capabilities of wafers up to 12 inches, the ME-210(-T) provides a high-resolution mode, allowing zooming into areas as small as a few micrometers.
Measurement area size: up to 12 inches (standard: 8 inches)
Spot size:
Standard mode : □ 0.55 mm
Intermediate mode: □ 55μm
High-resolution mode: □ 5.5μm

High-resolution

ME/SE Series features

Thin film of transparent substrate measurements available

With ME-210-T, we made possible the evaluation of objects that are usually too difficult to evaluate using standard ellipsometric techniques, such as organic thin films for OLED, etc.

non-uniformity evaluation of thin films over transparent substrates

ME/SE Series features

Simple & compact SE-101

This compact point measurement system provides high-accuracy and high-repeatability thin film measurements.
Its detachable head can be used as a separate module to integrate into your manufacturing infrastructure.


Head is detachable and can be integrated into our customer infrastructures




Lineup&Specifications

ME/SE Series features

Specifications
ME/SE Series

Customizations, such as integration in manufacturing line or modification to a specific sample material or shape are welcome.

me210-t

 ME-210-TME-210SE-101
Measurement
Repeatability Thickness: 0.1nm
Refractive index: 0.001 ※
Thickness: 0.1nm
Refractive index: 0.001 ※
SpeedMax. speed
≥ 900 points/min
(in standard mode, 100mm square area)
Smallest sampling interval
0.05 sec.
≥ 5,000 points/min
(in high-resolution, 1mm square area)
-
Light sourceSemiconductor Laser
(wavelength: 636nm)
Semiconductor Laser
(wavelength: 636nm)
Spot sizeStandard mode: 0.5mm □
High-resolution mode: 5.5µm □
Approx. 1mm □
Incident angle70°70°70°
Transparent
substrate
measurement
OKNGNG
Hardware
Sample stage sizeMax. 8 inch
(Φ300mm in option)
Max. 4 inch
(manual XY stage in option
stroke: ±20mm)
Dimensions
(W x D x H)
650 × 650 × 1744 mm650 × 650 × 1740mm250 × 175 × 218.3mm
WeightApprox. 200kgApprox. 200kgApprox. 5kg
Miscellaneous
Interface GigE(camera signal) GigE(camera signal)
Power
supply
AC100~240V AC100~240V
SoftwareME-ViewSE-View
AccessoriesDesktop PC
Monitor
User manual
Standard sample
Notebook PC
User manual
Standard sample

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